Department of Electronics. University of Valladolid

Atomistic Process Simulation at e-UVA

back to KMC results

Papers about the simulation technique and its capabilities:

· Martin-Bragado I, Zographos N, Jaraiz M
Long and double hop kinetic Monte Carlo: Techniques to speed up atomistic modeling without losing accuracy.
Mater. Sci. Eng. B 154, 202-206 (2008)

· M. Jaraiz, P. Castrillo, R. Pinacho, and J. E. Rubio
Current Capabilities and Future Prospects of Atomistic Process Simulation
IEEE International Electron Device Meeting (IEDM 2007), 951-954 (2007) pdf (2MB)

· Features and Enhancements in Sentaurus Version Z-2007.03 (see section on ‘New Kinetic Monte Carlo Features’) pdf (1.9 MB)
TCAD News. Synopsys, March 2007.

· Colombeau-B; Yeong-SH; Pandey-SM; Benistant-F; Jaraiz-M; Chui-S
Coupling advanced atomistic process and device modeling for optimizing future CMOS devices
2006 International Symposium on VLSI Technology, Systems and Applications. IEEE (2006) p.145-6

· L. M Vega
Calibración de parámetros e implementación de un sistema de ayuda para un simulador atomístico de procesos tecnológicos
Diploma Project. University of Valladolid (2006) pdf (7.2MB)

· Process Simulation Using Atomistic, State-of-the-Art, Kinetic Monte Carlo Models pdf (6 MB)
TCAD News. Synopsys, June 2006.

· Martin-Bragado-I
Simulación atomística de procesos para Microelectrónica
Tesis doctoral. Universidad de Valladolid, 2004 pdf (6.5MB)

· Jaraiz-M
Atomistic Simulations in Materials Processing.
“Predictive Simulation of Semiconductor Processing”, ed. by Dabrowsky-J & Weber-ER
Springer-Verlag (Berlin, 2004) p.73-109

· Strecker-N; Moroz-V; Jaraiz-M.
Introducing Monte Carlo Diffusion Simulation into TCAD tools
Tech. Proc. 2nd Int. Conf. on Computational Nanoscience and Nanotechnology (2002) pdf (930 KB)

· Jaraiz-M; Castrillo-P; Pinacho-R; Martín-Bragado-I; Barbolla-J.
Atomistic Front-End Process Modeling: A Powerful Tool for Deep-Submicron Device Fabrication.
SISPAD Conference 2001. pdf (1 MB)

· Jaraiz-M; Rubio-E; Castrillo-P; Pelaz-L; Bailon-L; Barbolla-J; Gilmer-GH; Rafferty-CS.
Kinetic Monte Carlo simulations: an accurate bridge between ab initio calculations and standard process experimental data.
Mat. Sci. Semic. Proc. 3 (2000) p.59-63. pdf (174 KB)

· Jaraiz-M; Castrillo-P; Pinacho-R; Pelaz-L; Barbolla-J; Gilmer-GH; Rafferty-CS. Atomistic Modeling of Complex Silicon Processing Scenarios Mat. Res. Soc. Symp. Proc. 610 (2001) p.B11.1-7. pdf (324 KB) · Law-ME; Gilmer-GH; Jaraiz-M. Simulation of defects and diffusion phenomena in silicon. Mat. Res. Soc. Bull. 25 (2000) p.45-50. pdf (338 KB) · Jaraiz-M. Process Simulation – Atomistic “The Encyclopedia on Materials Science and Technology”. Elsevier Science. Text: pdf (49 KB). Figures: pdf (427 KB)

· Jaraiz-M; Pelaz-L; Rubio-E; Barbolla-J; Gilmer-GH; Eaglesham-DJ; Gossmann-HJ; Poate-JM.
Atomistic modeling of point and extended defects in crystalline materials.
Mat. Res. Soc. Symp. Proc. 532 (1998) p.43-53. pdf (423 KB)

back to KMC results